Difference between revisions of "Partners"
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− | <big> '''Hochschule Furtwangen''' </big> is a University of Applied Sciences (HAW) and member of the TriRhenaTech consortium. One of the largest Universities of Applied Sciences in Baden-Würtemberg with around 6600 students, it is also one of the top-ranked ones in respect to research indicators. The institution is involved through the research group of Prof. Dr. Ulrich Mescheder, that has a profound expertise in the realisation of microsensors and micractuators for different applications. Work on DEAP technology which will be used for force feedback has been initiated within the BMBF project iView (miniaturized tactile display to support navigation of blind people). Partner HFU is headed by Prof. Ulrich Mescheder, Director of the Institute of Applied Research. | + | |[[File:hfu.jpg|250px]] || || || <big> '''Hochschule Furtwangen''' </big> is a University of Applied Sciences (HAW) and member of the TriRhenaTech consortium. One of the largest Universities of Applied Sciences in Baden-Würtemberg with around 6600 students, it is also one of the top-ranked ones in respect to research indicators. The institution is involved through the research group of Prof. Dr. Ulrich Mescheder, that has a profound expertise in the realisation of microsensors and micractuators for different applications. Work on DEAP technology which will be used for force feedback has been initiated within the BMBF project iView (miniaturized tactile display to support navigation of blind people). Partner HFU is headed by Prof. Ulrich Mescheder, Director of the Institute of Applied Research. |
HFU brings micro- and nanosystems technology labs to the SPIRITS project. These outstanding facilities include in a clean room of around 270 m² machines and processes for the fabrication of micro- and nanosystems, including thin film technology, lithography (submicrometer resolution) and etching (dry and wet). | HFU brings micro- and nanosystems technology labs to the SPIRITS project. These outstanding facilities include in a clean room of around 270 m² machines and processes for the fabrication of micro- and nanosystems, including thin film technology, lithography (submicrometer resolution) and etching (dry and wet). |
Revision as of 13:44, 23 August 2017